22 julio 2015
For the first time, researchers have combined a novel synthesis process with commercial electron-beam lithography techniques to produce arrays of semiconductor junctions in arbitrary patterns within a single, nanometer-thick semiconductor crystal. The process transforms patterned regions of one existing, single-layer crystal into another. The two semiconductor crystals formed sharp junctions, the desired building blocks of electronics.img src=»http://feeds.feedburner.com/~r/sciencedaily/~4/GkLEcO8kxlA» height=»1″ width=»1″ alt=»»/
http://feeds.sciencedaily.com/~r/sciencedaily/~3/GkLEcO8kxlA/150722080638.htm
